Listed company Tianlong Optoelectronics teamed up with Huasheng Optoelectronics to develop MOCVD
On February 21, 2011, the mainland GEM listed company Tianlong Optoelectronics (300029) issued an announcement, Jiangsu Huasheng Tianlong Optoelectronic Equipment Co., Ltd. (hereinafter referred to as "Tianlong Optoelectronics" or "Company") and Huasheng Optoelectronic Equipment (Hong Kong) Limited The company (hereinafter referred to as “Huahao Optoelectronicsâ€) signed a joint venture contract for the establishment of a joint venture company between Jiangsu Huasheng Tianlong Optoelectronic Equipment Co., Ltd. and Huasheng Optoelectronic Equipment (Hong Kong) Co., Ltd. on February 18, 2011 in Jintan, Jiangsu Province. Tianlong Optoelectronics has invested in super-raised funds. Huasheng Optoelectronics has jointly established a Sino-foreign joint venture company in Changzhou with a number of MOCVD know-how and capital investment, mainly engaged in research and development, production, sales and after-sales of MOCVD equipment and epitaxial processes. Services, and the joint venture company will set up a subsidiary for research and development in Shanghai. Tianlong Optoelectronics invested RMB 533.33 million in super-raised investment. Huasheng Optoelectronics invested RMB 35.238 million in intangible intellectual property investment and RMB 6.666 million in capital investment.
Tianlong Optoelectronics (300029) is a GEM company dedicated to new energy equipment and its applications. The current main products include single crystal growth furnace, polycrystalline ingot furnace, multi-wire cutting machine, LED sapphire furnace, etc. After nearly 5 years The company has become an important new energy equipment supplier in China. In the next 3 to 5 years, the company will focus on the research, development, manufacturing and application of equipment in these two industrial chains in the important direction of the two new energy industries of the photovoltaic industry and the LED industry.
Huasheng Optoelectronics Co., Ltd. was founded by a group of LED experts and managers in the field of LED MOCVD. It has innovative LED MOCVD technology with independent intellectual property rights, and the team has more than 20 years of world-class mass production of semiconductor films. The technology and experience of deposition equipment. Mainly engaged in LED MOCVD equipment, technology, epitaxial process research and development, production, market operations and sales, and after-sales service. Mr. Chen Aihua is the legal representative of Huasheng Optoelectronics and the actual controller of Huasheng Optoelectronics.
According to the feasibility study report issued by the project, the development strategy of the core competitiveness of the joint venture company MOCVD equipment is:
a) Reduce chip epitaxial manufacturing cost by more than 35%
b) Improve the reliability, stability, safety and system maintenance of equipment required for extended-scale mass production
c) providing high-performance chip epitaxial fabrication process
Compared to Aixtron and Veeco, the MOCVD system can increase unit capacity by more than 30%. Real-time temperature-controlled multi-independent heating element resistive heater design and vertical uniform separation spray-type reactive gas delivery combined with distributed nozzle system can not only effectively improve the yield of epitaxial wafers, but also solve current Aixtron and Veeco The reliability problems that exist in large-scale production of equipment and the reduction of system maintenance and consumption of expensive reaction gases.
In addition, the horizontal and vertical combined gas discharge technology used in the project can reduce impurity particles and improve the quality of epitaxial wafer crystallization, which not only increases the yield, but also reduces the consumption of expensive reaction gases. Through the above-mentioned ways to reduce the cost of equipment and consumables, the cost of the company's MOCVD equipment and consumable parts can be reduced by more than 30%.
Tianlong Optoelectronics (300029) is a GEM company dedicated to new energy equipment and its applications. The current main products include single crystal growth furnace, polycrystalline ingot furnace, multi-wire cutting machine, LED sapphire furnace, etc. After nearly 5 years The company has become an important new energy equipment supplier in China. In the next 3 to 5 years, the company will focus on the research, development, manufacturing and application of equipment in these two industrial chains in the important direction of the two new energy industries of the photovoltaic industry and the LED industry.
Huasheng Optoelectronics Co., Ltd. was founded by a group of LED experts and managers in the field of LED MOCVD. It has innovative LED MOCVD technology with independent intellectual property rights, and the team has more than 20 years of world-class mass production of semiconductor films. The technology and experience of deposition equipment. Mainly engaged in LED MOCVD equipment, technology, epitaxial process research and development, production, market operations and sales, and after-sales service. Mr. Chen Aihua is the legal representative of Huasheng Optoelectronics and the actual controller of Huasheng Optoelectronics.
According to the feasibility study report issued by the project, the development strategy of the core competitiveness of the joint venture company MOCVD equipment is:
a) Reduce chip epitaxial manufacturing cost by more than 35%
b) Improve the reliability, stability, safety and system maintenance of equipment required for extended-scale mass production
c) providing high-performance chip epitaxial fabrication process
Compared to Aixtron and Veeco, the MOCVD system can increase unit capacity by more than 30%. Real-time temperature-controlled multi-independent heating element resistive heater design and vertical uniform separation spray-type reactive gas delivery combined with distributed nozzle system can not only effectively improve the yield of epitaxial wafers, but also solve current Aixtron and Veeco The reliability problems that exist in large-scale production of equipment and the reduction of system maintenance and consumption of expensive reaction gases.
In addition, the horizontal and vertical combined gas discharge technology used in the project can reduce impurity particles and improve the quality of epitaxial wafer crystallization, which not only increases the yield, but also reduces the consumption of expensive reaction gases. Through the above-mentioned ways to reduce the cost of equipment and consumables, the cost of the company's MOCVD equipment and consumable parts can be reduced by more than 30%.
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